Reactive Ion Etcher Silicon
Etching/material removal used for patterning silicon
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Post author: MCN. Last update: 26/09/2013 at 10:48 am by MCN.
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Overview
Manufacturer: Oxford Instruments , Plasmalab100 ICP380. Installed 2010.
Bosch and cryogenic processes
Benefits of the Reactive Ion Etcher Silicon
None have been added
Technical features and specifications
None have been added
This instrument is heavily booked
Operation: User or facility staff operate pricing may vary Capacity: