Reactive Ion Etcher Silicon
Etching/material removal used for patterning silicon
You need to login or register to bookmark/favorite this content.
Post author: MCN. Last update: 26/09/2013 at 10:48 am by MCN.
Phone:
Overview
Manufacturer: Oxford Instruments , Plasmalab100 ICP380. Installed 2010.
Bosch and cryogenic processes
Benefits of the Reactive Ion Etcher Silicon
None have been added
Technical features and specifications
None have been added
Capacity: This instrument is heavily booked
Operation: User or facility staff operate pricing may vary
