Reactive Ion Etcher Silicon

Etching/material removal used for patterning silicon

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Post author: MCN. Last update: 26/09/2013 at 10:48 am by MCN.

Overview

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Details

Overview

Manufacturer: Oxford Instruments , Plasmalab100 ICP380. Installed 2010.

Bosch and cryogenic processes

Benefits of the Reactive Ion Etcher Silicon

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Technical features and specifications

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Capacity: This instrument is heavily booked
Operation: User or facility staff operate pricing may vary