Reactor for the deposition of plasma polymerised films via plasma enhanced chemical vapour deposition (PECVD) used for etching, treating and deposition on surfaces
Post author: Karyn Jarvis. Last update: 22/09/2015 at 4:05 pm by Karyn Jarvis.
Plasma polymerisation is a substrate independent technique for modifying the surfaces of materials by adding a thin film which possesses specific functional groups. Plasma polymerisation conventionally occurs at low pressure where plasma is produced by a glow discharge through an organic vapour. The organic monomer is introduced into the chamber as a vapour and is fragmented via radio frequency resulting in plasma to form. The monomer fragments are deposited onto all surfaces in contact with the plasma, thus forming a polymer film. The plasma power, monomer flow rate and deposition time can be varied to control the thickness, structure and surface functionalities of the deposited films.
We have 6 custom made plasma reactors, each designated for particular surface chemistries or applications. One of the reactors is heated, to enable the vaporisation of monomers with low volatility.
Benefits of the Plasma Polymerisation Reactors
– Alkane bromides (ATRP Initiator)
– Essential Oils (antimicrobial)
Technical features and specifications
– 6 custom made reactors for plasma polymerisation (PE-CVD)
– <1-100 nm thin, pinhole-free polymer coatings
– Substrate independent
– Up to 20cm diameter samples
– Vacuum process (1 x 10-2 mbar)
– Can be set up to etch, treat and deposit surfaces