Plasma plus thermal system used for nano-structuring, element doping, and surface cleaning / functionalization.
Post author: Jane Dai. Last update: 03/02/2016 at 3:10 pm by Jane Dai.
This system combines plasma and thermal energy to fabricate nano-semiconductors. It can be used for nano-structuring, element doping, and surface cleaning / functionalization. Several plasma sources have been designed to enable different types of nano-fabrication.
Benefits of the Plasma plus thermal system
This combined low temperature plasma with thermal energy system provides a versatile single step procedure for the production of doped nanostructured materials and nano-fabrication.
Technical features and specifications
None have been added
We encourage greater utilisation
Operation: Facility staff operate this instrument, User operated training provided, User or facility staff operate
Access: Access pricing may vary, External researcher use availableCapacity: