PECVD

Instrument: PECVD

Plasma enhanced chemical vapour deposition system used for deposition of silicon dioxide and silicon nitrate thin films

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Post author: MCN. Last update: 26/09/2013 at 10:57 am by MCN.

Overview

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Details

Overview

Manufacturer: Oxford Instruments , Plasmalab100 PECVD. Installed 2010.

Temp: 25 to 350°C

Benefits of the PECVD

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Technical features and specifications

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Capacity: We encourage greater utilisation
Operation: User or facility staff operate pricing may vary