Ultra-high resolution FEG-SEM (0.6nm resolution) used for Ultra high resolution and microanalysis
Post author: Colin Macrae. Last update: 02/04/2014 at 9:52 am by Colin Macrae.
Large area X-ray detoctor with light element sensitivity, elemental mapping and imaging
Benefits of the Hitachi S5000 – In Lens Field Emission SEM with Oxford EDS and Fast BSE
Ultra-high resolution electron microscope with cold field emission gun able to deliver 0.6nm resolution at 30kV. Instrument is supported by ion beam polishing and ion beam coating facilities offering a range of surface preparation and finishes suitable for imaging a wide range of materials under high vacuum.
The microscope is equipped with a large area x-ray detector which is sensitive from Be – U.
Technical features and specifications
None have been added