FEG source Scanning Electron Microscope used for Ultra high resolution imaging of surfaces, elemental analysis, e-beam lithography, Pt deposition on nm scale
Post author: Philip Francis. Last update: 01/03/2014 at 5:21 pm by Philip Francis.
Manufacturer: FEI, Nova NanoSEM 200. Installed 2008.
Ultra high resolution SEM utilising magnetic immersion lens giving 1 nm resolution
Has Oxford AZtec EDS(Energy Dispersive X-ray Spectrometer for elemental composition analysis with spatial resolution down to a few nm in STEM mode.
Has Low vacuum mode.
Has Nabity e-beam lithography system to allow e-beam writing for device fabrication.
Has Pt GIS to permit Pt deposition at nm scale
Funding sources: ARC LEIF
Benefits of the FEI Nova NanoSEM, AZtec EDS, Lithography, Pt deposition
Ultra high resolution imaging of conducting and (In Low Vacuum mode) non-conductive specimens.
Technical features and specifications
1 nm resolution in imaging (SE mode)