FEI Nova NanoSEM, AZtec EDS, Lithography, Pt deposition

FEG source Scanning Electron Microscope used for Ultra high resolution imaging of surfaces, elemental analysis, e-beam lithography, Pt deposition on nm scale


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Post author: Philip Francis. Last update: 01/03/2014 at 5:21 pm by Philip Francis.





Manufacturer: FEI, Nova NanoSEM 200. Installed 2008.

Ultra high resolution SEM utilising magnetic immersion lens giving 1 nm resolution
Has Oxford AZtec EDS(Energy Dispersive X-ray Spectrometer for elemental composition analysis with spatial resolution down to a few nm in STEM mode.
Has Low vacuum mode.
Has Nabity e-beam lithography system to allow e-beam writing for device fabrication.
Has Pt GIS to permit Pt deposition at nm scale

Funding sources: ARC LEIF

Benefits of the FEI Nova NanoSEM, AZtec EDS, Lithography, Pt deposition

Ultra high resolution imaging of conducting and (In Low Vacuum mode) non-conductive specimens.

Technical features and specifications

1 nm resolution in imaging (SE mode)


Capacity: This instrument is heavily booked
Operation: User operated training provided, User or facility staff operate pricing may vary
Access: External researcher use available