DualBeam FIB-SEM

Instrument: DualBeam FIB-SEM

This machine combines a scanning electron microscope (SEM) and a focused ion bea (FIB) with gas chemistries used for High resolution patterning and characterisation of nanostructures


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Post author: MCN. Last update: 16/09/2013 at 10:00 am by MCN.





Manufacturer: FEI, Helios NanoLab 600

The FIB-SEM at the MCN has several features including:
Genesis EDX detector: an Energy Dispersive X-ray Spectrometer (EDAX) that can be used to analyze the atomic composition of a sample.
Pt Deposition GIS: This gas injection system allows for platinum deposition. Some applications for this include circuit editing, micron scale manufacturing, and as an aid for sample lift-out.
Selective Carbon Mill GIS: A gas injection system to enhance etching of carbon-containing materials such as diamond, polyamide, PMMA and other organic materials by a minimum factor of 10.
STEM Detector: This detector allows SEM to be used to image very thin samples in transmission, offers great opportunity to acquire TEM comparable images with all advantages of the SEM.
Kleindiek micromanipulator: This is an insertable probe allows in-situ physical sample manipulation and characterization at the micro- and nanoscale.
Kleindiek Lift-out shuttle: This is in-situ lift-out techniques for preparation of samples requiring TEM and atom probe inspection.

Benefits of the DualBeam FIB-SEM

Resist free, high resolution patterning of nanostructures,
Characterisation of the fine structures with an excellent grain contrast imaging,
Chemical composition analysis on areas as small as nanometers in diameter,
Very precise cross sectional analysis of samples,
Sample preparation for transmission electron microscopy (TEM),
Sample preparation for AtomProbe analysis,
Electronics and semiconductors failure analysis

Technical features and specifications

None have been added


Capacity: This instrument is heavily booked
Operation: User or facility staff operate pricing may vary
Access: External researcher use available