ALD Savannah S100

Instrument: ALD Savannah S100

Atomic Layer Deposition Apparatus used for Depositing thin films of metals and metal oxides through atomic layer deposition

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Post author: MCN. Last update: 19/09/2013 at 3:06 pm by MCN.

Overview

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Details

Overview

Manufacturer: Cambridge Nanotech, Savannah S100

Exposure mode available for high aspect ratio structures.
System is installed in inert nitrogen atmosphere.

Benefits of the ALD Savannah S100

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Technical features and specifications

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Tags

Capacity: We encourage greater utilisation
Operation: User or facility staff operate pricing may vary
Access: External researcher use available