ALD Fiji F200

Instrument: ALD Fiji F200

Atomic Layer Deposition Aparatus used for Depositing thin films of metals and metal oxides through atomic layer deposition

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Post author: MCN. Last update: 19/09/2013 at 3:03 pm by MCN.

Overview

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Details

Overview

Manufacturer: Cambridge Nanotech, Fiji F200

Plasma enhanced mode and exposure mode available for high aspect ratio structures

Benefits of the ALD Fiji F200

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Technical features and specifications

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Tags

Capacity: We encourage greater utilisation
Operation: User or facility staff operate pricing may vary
Access: External researcher use available