This custom-designed facility combines physical vapour deposition with plasma enhanced chemical vapour deposition in a dual chamber system. In the PVD chamber, a Torus Magnetron sputter source and the substrate rotation feed-through provide the best film uniformity. It also has a high strength magnet assembly for sputtering magnetic materials. The PECVD also includes a substrate heater that allows samples to be heated to 800°C and DC/RF biasing to control the direction of nanomaterial growth. The samples can be horizontally transferred from one chamber to the other via a power probe (without exposure to air). Its multi-functional capabilities enable the dry fabrication of nanostructures (both top-down and bottom-up), their surface treatment, and multi-layer thin films & nanostructuring of materials in one instrument.

Its multi-functional capabilities enable the dry fabrication of nanostructures (both top-down and bottom-up), their surface treatment, and multi-layer thin films & nanostructuring of materials in one instrument.

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